Improved Mounting of Strain Sensors by Reactive Bonding.

Aim of this work is to improve the bond between a strain sensor and a device on which the strain shall be determined. As strain sensor, a CMOS-integrated chip featuring piezoresistive sensor elements was used which is capable of wireless energy and data transmission. The sensor chip was mounted on a standardized tensile test specimen of stainless steel by a bonding process using reactive multilayer systems (RMS). RMS provide a well-defined amount of heat within a very short reaction time of a few milliseconds and are placed in-between two bonding partners. RMS were combined with layers of solder which melt during the bonding process. Epoxy adhesive films were used as a reference bonding process. Under mechanical tensile loading, the sensor bonded with RMS shows a linear strain sensitivity in the whole range of tested forces whereas the adhesive-bonded sensor has slightly nonlinear behavior for low forces. Compared to the adhesive-bonded chips, the sensitivity of the reactively bonded chips is increased by a factor of about 2.5. This indicates a stronger mechanical coupling by reactive bonding as compared to adhesive bonding.

Effect of Energy and Temperature on Tetrahedral Amorphous Carbon Coatings Deposited by Filtered Laser-Arc.

In this study, both the plasma process of filtered laser-arc evaporation and the resulting properties of tetrahedral amorphous carbon coatings are investigated. The energy distribution of the plasma species and the arc spot dynamics during the arc evaporation are described. Different ta-C coatings are synthesized by varying the bias pulse time and temperature during deposition. An increase in hardness was observed with the increased overlapping of the bias and arc pulse times. External heating resulted in a significant loss of hardness. A strong discrepancy between the in-plane properties and the properties in the film normal direction was detected specifically for a medium temperature of 120 °C during deposition. Investigations using electron microscopy revealed that this strong anisotropy can be explained by the formation of nanocrystalline graphite areas and their orientation toward the film's normal direction. This novel coating type differs from standard amorphous a-C and ta-C coatings and offers new possibilities for superior mechanical behavior due to its combination of a high hardness and low in-plane Young's Modulus.

Point focusing with flat and wedged crossed multilayer Laue lenses.

Point focusing measurements using pairs of directly bonded crossed multilayer Laue lenses (MLLs) are reported. Several flat and wedged MLLs have been fabricated out of a single deposition and assembled to realise point focusing devices. The wedged lenses have been manufactured by adding a stress layer onto flat lenses. Subsequent bending of the structure changes the relative orientation of the layer interfaces towards the stress-wedged geometry. The characterization at ESRF beamline ID13 at a photon energy of 10.5 keV demonstrated a nearly diffraction-limited focusing to a clean spot of 43 nm × 44 nm without significant side lobes with two wedged crossed MLLs using an illuminated aperture of approximately 17 µm × 17 µm to eliminate aberrations originating from layer placement errors in the full 52.7 µm × 52.7 µm aperture. These MLLs have an average individual diffraction efficiency of 44.5%. Scanning transmission X-ray microscopy measurements with convenient working distances were performed to demonstrate that the lenses are suitable for user experiments. Also discussed are the diffraction and focusing properties of crossed flat lenses made from the same deposition, which have been used as a reference. Here a focal spot size of 28 nm × 33 nm was achieved and significant side lobes were noticed at an illuminated aperture of approximately 23 µm × 23 µm.

Full-field X-ray microscopy with crossed partial multilayer Laue lenses.

We demonstrate full-field X-ray microscopy using crossed multilayer Laue lenses (MLL). Two partial MLLs are prepared out of a 48 µm high multilayer stack consisting of 2451 alternating zones of WSi2 and Si. They are assembled perpendicularly in series to obtain two-dimensional imaging. Experiments are done in a laboratory X-ray microscope using Cu-Kα radiation (E = 8.05 keV, focal length f = 8.0 mm). Sub-100 nm resolution is demonstrated without mixed-order imaging at an appropriate position of the image plane. Although existing deviations from design parameters still cause aberrations, MLLs are a promising approach to realize hard X-ray microscopy at high efficiencies with resolutions down to the sub-10 nm range in future.

Ptychography with multilayer Laue lenses.

Two different multilayer Laue lens designs were made with total deposition thicknesses of 48 µm and 53 µm, and focal lengths of 20.0 mm and 12.5 mm at 20.0 keV, respectively. From these two multilayer systems, several lenses were manufactured for one- and two-dimensional focusing. The latter is realised with a directly bonded assembly of two crossed lenses, that reduces the distance between the lenses in the beam direction to 30 µm and eliminates the necessity of producing different multilayer systems. Characterization of lens fabrication was performed using a laboratory X-ray microscope. Focusing properties have been investigated using ptychography.